Ultraclean, integrated processing of thermal oxide structures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103501
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3. High-Temperature SiO2Decomposition at the SiO2/Si Interface
4. Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2
5. A study of the oxidation and reduction by water vapour of Si (111) surfaces using auger electron emission
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