Reaction of Hydrogen-Terminated Si(100) Surfaces with Oxygen at Very Low Pressures during Heating
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Published:2005-11-09
Issue:11
Volume:44
Page:8091-8095
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Urabe Shinichi,Nishimura Kazuo,Nishikawa Syuhei,Morita Satoru,Morita Mizuho
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering