Localized wet‐chemical etching of InP induced by laser heating
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94430
Reference10 articles.
1. Laser chemical technique for rapid direct writing of surface relief in silicon
2. Laser chemical technique for rapid direct writing of surface relief in silicon
3. Laser‐photoinduced etching of semiconductors and metals
4. Laser enhanced etching in KOH
5. Localized laser etching of compound semiconductors in aqueous solution
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1. 3D Microengineering via Laser Direct-Write Processing Approaches;Direct-Write Technologies for Rapid Prototyping;2002
2. Laser-assisted thermally enhanced InP via etching for microwave device applications;IEEE Transactions on Semiconductor Manufacturing;1993
3. Laserelektrochemie;Laser in Technik und Forschung;1993
4. Photochemical etching ofn‐InP as a function of temperature and illumination;Journal of Applied Physics;1990-07-15
5. References;Thin Films by Chemical Vapour Deposition;1990
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