Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.110509
Reference13 articles.
1. Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask
2. High-reflectivity monomode-fibre grating filters
3. Changes in the chemical stability of ion-implanted silica glass
4. Fabrication of planar silicon transistors without photoresist
5. Ion projection system for IC production
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