Changes in the chemical stability of ion-implanted silica glass
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577608233060
Reference34 articles.
1. X-Ray Lithography: A Complementary Technique to Electron Beam Lithography
2. Ion Beam Micromachining of Integrated Optics Components
3. ION‐BOMBARDMENT‐ENHANCED ETCHING OF SILICON
4. Mobilization of sodium in SiO2films by ion bombardment
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