Characterization of an inductively coupled nitrogen-argon plasma by Langmuir probe combined with optical emission spectroscopy
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3554706
Reference38 articles.
1. Experiments and global model of inductively coupled rf Ar/N2 discharges
2. Nitrogen dissociation in a low pressure cylindrical ICP discharge studied by actinometry and mass spectrometry
3. Ionized physical vapor deposition of titanium nitride: A global plasma model
4. Surface reactions during etching of organic low-k films by plasmas of N2 and H2
5. Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma
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