Author:
Ishikawa Kenji,Yamaoka Yoshikazu,Nakamura Moritaka,Yamazaki Yuichi,Yamasaki Satoshi,Ishikawa Yasushi,Samukawa Seiji
Subject
General Physics and Astronomy
Reference22 articles.
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2. Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N2/H2 and N2/NH3 plasmas
3. Etching organic low dielectric film in ultrahigh frequency plasma using N2/H2 and N2/NH3 gases
4. Y. Yamaoka, Ph.D. Thesis, Department of Accelerator Science, Graduate University of Advanced Studies, 2005.
5. Low-k materials etching in magnetic neutral loop discharge plasma
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