Smoothing of fused silica with less damage by a hybrid plasma process combining isotropic etching and atom-migration

Author:

Liang ShaoxiangORCID,He Yi,Ding PengboORCID,Wang Chunjin,Guo Liang,Deng HuiORCID

Funder

Science, Technology and Innovation Commission of Shenzhen Municipality

National Natural Science Foundation of China

Natural Science Foundation of Guangdong Province

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

Reference46 articles.

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4. Development of dioptric projection lenses for deep ultraviolet lithography at Carl Zeiss;Ulrich;J. Micro/Nanolithogr.,2004

5. 157 nm: deepest deep-ultraviolet yet;Rothschild;Sci. Technol. B Microelectron. Nanom. Struct. Process. Meas. Phenom.,1999

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