Electron scattering mechanisms in Cu-Mn films for interconnect applications
Author:
Affiliation:
1. Research Centre for Natural Sciences, Hungarian Academy of Sciences, H-1525 Budapest, P.O. Box 49, Hungary,
2. Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04 Bratislava, Slovak Republic
Funder
Magyar Tudományos Akadémia (Hungarian Academy of Sciences)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://scitation.aip.org/deliver/fulltext/aip/journal/jap/116/8/1.4893718.pdf?itemId=/content/aip/journal/jap/116/8/10.1063/1.4893718&mimeType=pdf&containerItemId=content/aip/journal/jap
Reference28 articles.
1. Self-forming diffusion barrier layer in Cu–Mn alloy metallization
2. Growth kinetics and thermal stability of a self-formed barrier layer at Cu-Mn∕SiO2 interface
3. Growth behavior of self-formed barrier at Cu–Mn∕SiO2 interface at 250–450°C
4. Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures
5. Phase identification of self-forming Cu–Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structure
Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Persistent Photoconductivity Control in Zn-Doped SnO2 Thin Films for the Performance Enhancement of Solar-Blind Ultraviolet Photodetectors;ACS Photonics;2023-10-31
2. Thermal, Mechanical, and Electrical Stability of Cu Films in an Integration Process with Photosensitive Polyimide (PSPI) Films;Nanomaterials;2023-09-26
3. Characteristic of CuMn Alloy Films Prepared Using Electrochemical Deposition;Journal of Materials Engineering and Performance;2023-08-07
4. A Comparative Investigation on the Microstructure and Thermal Resistance of W-Film Sensor Using dc Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering;Magnetochemistry;2023-03-31
5. Characteristic of CuMn Alloy Films Prepared by Using Electrochemical Deposition;2022-11-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3