Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
Author:
Affiliation:
1. University of California, Los Angeles, California 90024, USA
2. Lam Research Corp, Fremont, California 90024, USA
Funder
U.S. Department of Energy
Division of Physics
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/am-pdf/10.1063/5.0007288
Reference40 articles.
1. Pulsed high-density plasmas for advanced dry etching processes
2. Effect of Power Modulation on Radical Concentration and Uniformity in a Single-Wafer Plasma Reactor
3. Diagnostics and control of radicals in an inductively coupled etching reactor
4. Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power
5. Pulsed inductively coupled plasmas as a method to recoup uniformity: Three-dimensional modeling study
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Future of plasma etching for microelectronics: Challenges and opportunities;Journal of Vacuum Science & Technology B;2024-06-07
2. Ion motion above a biased wafer in a plasma etching reactor;Physics of Plasmas;2024-06-01
3. Pulsed Inductive RF Discharge as an Effective Working Process of an RF Ion Source;Plasma Physics Reports;2023-11
4. E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions;Journal of Applied Physics;2023-05-01
5. Plasma density determination from ion current to cylindrical Langmuir probe with validation on hairpin probe measurements;Plasma Sources Science and Technology;2023-04-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3