Initial stage of native oxide growth on hydrogen terminated silicon (111) surfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.360853
Reference19 articles.
1. Growth of native oxide on a silicon surface
2. Control of the chemical reactivity of a silicon single‐crystal surface using the chemical modification technique
3. Oxidation of HF‐treated Si wafer surfaces in air
4. Initial Oxidation Process of Anodized Porous Silicon with Hydrogen Atoms Chemisorbed on the Inner Surface
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