Oxidation of HF‐treated Si wafer surfaces in air
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347056
Reference22 articles.
1. Surface chemistry of HF passivated silicon: X‐ray photoelectron and ion scattering spectroscopy results
2. Unusually Low Surface-Recombination Velocity on Silicon and Germanium Surfaces
3. Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy
4. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology
5. The formation of hydrogen passivated silicon single‐crystal surfaces using ultraviolet cleaning and HF etching
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