Extraction of negative ions from pulsed electronegative capacitively coupled plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4745877
Reference22 articles.
1. Impact of phase lag on uniformity in pulsed capacitively coupled plasmas
2. Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching
3. Effect of simultaneous source and bias pulsing in inductively coupled plasma etching
4. Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics
5. Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices
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