Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics-Reference-Cited by-同舟云学术

Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics

Published:2012-01 Issue:1 Volume:30 Page:011206
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Shi Hualiang,Huang Huai,Bao Junjing,Liu Junjun,Ho Paul S.,Zhou Yifeng,Pender Jeremy T.,Armacost Michael D.,Kyser David

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3671008

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