Heating mode transition in a hybrid direct current/dual-frequency capacitively coupledCF4discharge
Author:
Funder
NNSFC
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4882297
Reference31 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Plasma Electronics
3. Dual excitation reactive ion etcher for low energy plasma processing
4. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
5. Study on the dual frequency capacitively coupled plasmas by the particle-in-cell/Monte Carlo method
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