Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3259420
Reference16 articles.
1. Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas
2. Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
3. Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD);Bera K.,2006
4. Control of the Harmonics Generation in a Capacitively Coupled Plasma Reactor
5. A three‐dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments
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