Electrical properties of planar rf discharges for dry etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336177
Reference17 articles.
1. Electrical Properties of RF Sputtering Systems
2. Influence of Scattering and Ionization on RF Impedance in Glow Discharge Sheaths
3. The rf glow‐discharge sputtering model
4. Experimental and design information for calculating impedance matching networks for use in rf sputtering and plasma chemistry
5. Plasma parameter estimation from rf impedance measurements in a dry etching system
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