Rapid solid-phase crystallization of high-rate, hot-wire chemical-vapor-deposited hydrogenated amorphous silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2361163
Reference11 articles.
1. Crystalline silicon on glass (CSG) thin-film solar cell modules
2. Solid phase post-treatment of polysilicon films by a continuous argon laser
3. Integrated amorphous and polycrystalline silicon thin-film transistors in a single silicon layer
4. Structural properties of hot wire a-Si:H films deposited at rates in excess of 100 Å/s
5. Crystal grain nucleation in amorphous silicon
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1. A comparative study on the direct deposition of μc-Si:H and plasma-induced recrystallization of a-Si:H: Insight into Si crystallization in a high-density plasma;Applied Surface Science;2018-03
2. Hydrogen-plasma-induced Rapid, Low-Temperature Crystallization of μm-thick a-Si:H Films;Scientific Reports;2016-09-07
3. Impact of deposition parameters on the material quality of SPC poly-Si thin films using high-rate PECVD of a-Si:H;EPJ Photovoltaics;2015
4. Kinetic Study of the Thermal Crystallization Behavior of Hydrogenated Amorphous Silicon Prepared by ECRCVD;ECS Journal of Solid State Science and Technology;2014
5. On the transient amorphous silicon structures during solid phase crystallization;Journal of Non-Crystalline Solids;2013-03
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