Kinetic Study of the Thermal Crystallization Behavior of Hydrogenated Amorphous Silicon Prepared by ECRCVD-Reference-Cited by-同舟云学术

Kinetic Study of the Thermal Crystallization Behavior of Hydrogenated Amorphous Silicon Prepared by ECRCVD

Published:2014 Issue:5 Volume:3 Page:N75-N82
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Chen I-Chen,Lin Pei-Yi,Li Tomi T.,Chang Jenq-Yang

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Reversible conductivity changes in discharge‐produced amorphous Si

2. The Influence of Electromechanical Stress on the Stability of Nanocrystalline Silicon Thin Film Transistors Made on Colorless Polyimide Foil

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4. Effects of annealing temperature on crystallisation kinetics, film properties and cell performance of silicon thin-film solar cells on glass

5. Solid-phase crystallization of amorphous silicon on ZnO:Al for thin-film solar cells

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