Reactive‐flow simulation of the hot‐filament chemical‐vapor deposition of diamond
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354368
Reference31 articles.
1. Measurement of stable species present during filament‐assisted diamond growth
2. Gas‐phase kinetics during diamond growth: CH4as‐growth species
3. Methyl radical and H‐atom concentrations during diamond growth
4. The role of hydrogen in vapor deposition of diamond
5. Experimental and calculational study on diamond growth by an advanced hot filament chemical vapor deposition method
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1. Effect of CH4 concentration on the early growth stage of patterned diamond using high seeding density and hot filament chemical vapor deposition;Journal of Materials Science;2024-04
2. Numerical Simulation of 3-Dimensional Temperature Distribution in a Hot Filament Chemical Vapor Deposition Chamber;Science of Advanced Materials;2019-11-01
3. Effects of deposition parameters on HFCVD diamond films growth on inner hole surfaces of WC–Co substrates;Transactions of Nonferrous Metals Society of China;2015-03
4. THE EFFECT OF THE GAS OUTLET ON THE GAS VELOCITY FIELD IN MASS-PRODUCTION OF HFCVD DIAMOND-COATED DRILLS;Surface Review and Letters;2014-08
5. Surface morphology, growth rate and quality of diamond films synthesized in hot filament CVD system under various methane concentrations;Applied Surface Science;2011-08
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