Low temperature plasmas induced in SF6 by extreme ultraviolet (EUV) pulses
Author:
Affiliation:
1. Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw, Poland
Funder
EU Horizon 2020, LASERLAB-EUROPE
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5030965
Reference32 articles.
1. Gas discharge plasmas and their applications
2. Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching
3. The etching of silicon carbide in inductively coupled SF6/O2plasma
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