Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference14 articles.
1. Extremely high‐selective electron cyclotron resonance plasma etching for phosphorus‐doped polycrystalline silicon
2. Effects of Sb or Sn Addition on Precipitation of the High-TcSuperconducting Phase from Rapidly Quenched Bi-Pb-Ca-Sr-Cu-O Glasses
3. Low radio frequency biased electron cyclotron resonance plasma etching
4. Time Variation of Plasma Properties in a Pulse-Time-Modulated Electron Cyclotron Resonance Discharge of Chlorine Gas
Cited by 137 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Microfabrication of piezoelectric MEMS based on thick LiNbO3 single-crystal films;Nanotechnology;2024-02-15
2. Plasma properties and discharging of dust particles in an Ar/C2H2 plasma afterglow;Journal of Physics D: Applied Physics;2024-01-16
3. Effect of oxygen negative ions on electron energy distribution function;Journal of the Korean Physical Society;2023-02-08
4. Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process;Physical Chemistry Chemical Physics;2022
5. Dust dynamics during the plasma afterglow;Journal of Physics D: Applied Physics;2021-11-18
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3