Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process-Reference-Cited by-同舟云学术

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O₂/C₄F₈ plasma etching process

Published:2022 Issue:22 Volume:24 Page:13883-13896
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Sahu Bibhuti Bhusan¹²^ORCID,Nakane Kazuya¹,Ishikawa Kenji¹^ORCID,Sekine Makoto¹,Tsutsumi Takayoshi¹,Gohira Taku³,Ohya Yoshinobu³,Ohno Noriyasu¹⁴,Hori Masaru¹

Affiliation:

1. Center for Low-temperature Plasma Sciences, Nagoya University, Nagoya 464-8601, Japan

2. Multi-Functional Plasma Laboratory, Department of Energy Science and Engineering, Indian Institute of Technology Delhi, Delhi-110016, India

3. Tokyo Electron Miyagi Ltd., Kurokawa, Miyagi 981-3629, Japan

4. Department of Energy Engineering & Sciences, Nagoya University, Nagoya 464-8601, Japan

Abstract

A modified Boltzmann equation using the corona model was used to study the plasma characteristics of a pulse plasma etching process.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2022/CP/D2CP00289B

Reference66 articles.

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2. Electron heating in capacitively coupled plasmas revisited

3. Capacitively coupled glow discharges at frequencies above 13.56 MHz

4. Electron heating mode transition induced by mixing radio frequency and ultrahigh frequency dual frequency powers in capacitive discharges

5. Collisionless Heating in Capacitive Discharges Enhanced by Dual-Frequency Excitation

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