The effect of water uptake on the mechanical properties of low-k organosilicate glass
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4817917
Reference35 articles.
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4. Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
5. Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. II. Water uptake and change in dielectric constant
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