Si‐SiO2interface characterization from angular dependence of x‐ray photoelectron spectra
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91278
Reference17 articles.
1. An ESCA Study of the Oxide at the Si ‐ SiO2 Interface
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