Electron mean escape depths from x−ray photoelectron spectra of thermally oxidized silicon dioxide films on silicon
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Published:1975-01
Issue:1
Volume:12
Page:305-308
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ISSN:0022-5355
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Container-title:Journal of Vacuum Science and Technology
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language:en
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Short-container-title:Journal of Vacuum Science and Technology
Author:
Flitsch R.,Raider S. I.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
297 articles.
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