Abstract: Stoichiometry of SiO2/Si interfacial regions. I. Ultrathin oxide films
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Published:1976-01
Issue:1
Volume:13
Page:58-58
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ISSN:0022-5355
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Container-title:Journal of Vacuum Science and Technology
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language:en
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Short-container-title:Journal of Vacuum Science and Technology
Author:
Raider S. I.,Flitsch R.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
77 articles.
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