Time-resolved ion energy distribution functions in the afterglow of an EUV-induced plasma
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology, 5612AP Eindhoven, The Netherlands
2. ASML, 5504DR Veldhoven, The Netherlands
Funder
ASML
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5125739
Reference33 articles.
1. Extreme ultraviolet lithography: Status and prospects
2. EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology
3. Kinetic simulation of an extreme ultraviolet radiation driven plasma near a multilayer mirror
4. Hydrogen interaction with EUVL-relevant optical materials
5. Ion effects in hydrogen-induced blistering of Mo/Si multilayers
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1. Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests;Journal of Vacuum Science & Technology B;2023-01-01
2. EUV-induced hydrogen plasma: pulsed mode operation and confinement in scanner;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-08-16
3. Magnetic field-enhanced beam monitor for ionizing radiation;Review of Scientific Instruments;2020-06-01
4. Particle contamination control by application of plasma;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23
5. Transition from ambipolar to free diffusion in an EUV-induced argon plasma;Applied Physics Letters;2020-03-09
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