Magnetic field-enhanced beam monitor for ionizing radiation-Reference-Cited by-同舟云学术

Magnetic field-enhanced beam monitor for ionizing radiation

Published:2020-06-01 Issue:6 Volume:91 Page:063503
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Platier B.¹^ORCID,Limpens R.¹²^ORCID,Lassise A. C.²,Oosterholt T. T. J.¹^ORCID,van Ninhuijs M. A. W.¹^ORCID,Daamen K. A.¹^ORCID,Staps T. J. A.¹^ORCID,Zangrando M.³⁴^ORCID,Luiten O. J.¹^ORCID,IJzerman W. L.⁵⁶,Beckers J.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600MB Eindhoven, The Netherlands

2. ASML Netherlands B.V., De Run 6501, 5504DR Veldhoven, The Netherlands

3. Elettra-Sincrotrone Trieste, Basovizza I-34149, Italy

4. IOM-CNR, Basovizza I-34149, Italy

5. Department of Mathematics and Computer Science, Eindhoven University of Technology, P.O. Box 513, 5600MB Eindhoven, The Netherlands

6. Signify High Tech Campus 7, 5656AE Eindhoven, The Netherlands

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0007092

Reference44 articles.

1. Plasma sources for EUV lithography exposure tools

2. Comparison of H2and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

3. Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation

4. Image formation in EUV lithography: Multilayer and resist properties

5. Shot noise, LER, and quantum efficiency of EUV photoresists

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