Transition from ambipolar to free diffusion in an EUV-induced argon plasma-Reference-Cited by-同舟云学术

Transition from ambipolar to free diffusion in an EUV-induced argon plasma

Published:2020-03-09 Issue:10 Volume:116 Page:103703
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Platier B.¹^ORCID,Limpens R.¹²^ORCID,Lassise A. C.²,Staps T. J. A.¹^ORCID,van Ninhuijs M. A. W.¹^ORCID,Daamen K. A.¹^ORCID,Luiten O. J.¹^ORCID,IJzerman W. L.³⁴,Beckers J.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600MB Eindhoven, The Netherlands

2. ASML Netherlands B.V., De Run 6501, 5504DR Veldhoven, The Netherlands

3. Department of Mathematics and Computer Science, Eindhoven University of Technology, P.O. Box 513, 5600MB Eindhoven, The Netherlands

4. Signify, High Tech Campus 7, 5656AE Eindhoven, The Netherlands

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5142290

Reference33 articles.

1. Comparison of H2and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

2. Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source

3. Stability of extreme ultraviolet multilayer coatings to low energy proton bombardment

4. Blister formation in Mo/Si multilayered structures induced by hydrogen ions

5. Ion effects in hydrogen-induced blistering of Mo/Si multilayers

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