Plasma damage effects on low-k porous organosilicate glass
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3506523
Reference22 articles.
1. Mechanistic study of plasma damage of low k dielectric surfaces
2. Characteristics of HfO2 thin films grown by plasma atomic layer deposition
3. Micro-scratch analysis and mechanical properties of plasma-deposited silicon-based coatings on polymer substrates
4. High strength, low dielectric constant fluorinated silica xerogel films
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