Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating-Reference-Cited by-同舟云学术

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Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating

Published:2020-07 Issue:7 Volume:27 Page:073507
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Kwon Deuk-Chul¹^ORCID,Yu Dong-Hun²³,Kwon Hyoungcheol⁴,Im Yeon Ho³,Lee Hyo-Chang⁵^ORCID

Affiliation:

1. Plasma Technology Research Center, National Fusion Research Institute, Gunsan, Jeonbuk 54004, South Korea

2. Kwongwon Tech. Co., Ltd., Seongnam, Geonggi 13497, South Korea

3. Jeonbuk National University, Jeonju, Jeonbuk 54896, South Korea

4. SK Hynix, Inc., Icheon, Geonggi 17336, South Korea

5. Advanced Instrumentation Institute, Korea Research Institute of Standard and Science, Daejeon 34114, South Korea

Funder

SK Hynix Incoporated

National Fusion Research Institute

National Research Council of Science and Technology

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0006505

Reference40 articles.

1. Global model of Ar, O2, Cl2, and Ar/O2 high‐density plasma discharges

2. Global modeling of a dielectric barrier discharge in Ne–Xe mixtures for an alternating current plasma display panel

3. Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO2thin films

4. On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments

5. Analytical–numerical global model of atmospheric-pressure radio-frequency capacitive discharges

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2. Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation;Journal of Applied Physics;2023-01-24

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4. Spatially averaged ion temperature model for low-temperature plasma sources;Journal of Physics D: Applied Physics;2022-08-18

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