Plasma formation near the beam collector of a forevacuum-pressure plasma-cathode electron beam source
Author:
Affiliation:
1. Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk 634050, Russia
2. Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk 634055, Russia
Funder
Russian Foundation for Basic Research
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0021069
Reference21 articles.
1. Applications of electron-beam generated plasmas to materials processing
2. Electron beam generated plasmas for the processing of graphene
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4. Etching with atomic precision by using low electron temperature plasma
5. The role of electron induced secondary electron emission from SiO2surfaces in capacitively coupled radio frequency plasmas operated at low pressures
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1. Beam-generated plasma formation near a dielectric target irradiated by a pulsed electron beam in the forevacuum pressure range;Plasma Sources Science and Technology;2023-07-01
2. Effect of thermionic emission on the current in the circuit of a metal collector irradiated by an electron beam in the forevacuum pressure range;Vacuum;2023-06
3. Effects of gas pressure and bias potential on electron beam nitriding of titanium;Journal of Applied Physics;2022-06-07
4. Estimation and control of low (<100 V) potential on a dielectric target irradiated by an electron beam at fore-vacuum pressure;Plasma Sources Science and Technology;2021-08-01
5. Pulsed Discharge Plasma in High-Pressure Environment for Water Pollutant Degradation and Nanoparticle Synthesis;Plasma;2021-06-04
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