Etching with atomic precision by using low electron temperature plasma-Reference-Cited by-同舟云学术

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Etching with atomic precision by using low electron temperature plasma

Published:2017-06-19 Issue:27 Volume:50 Page:274003
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Dorf L,Wang J-C,Rauf S,Monroy G A,Zhang Y,Agarwal A,Kenney J,Ramaswamy K,Collins K

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/50/i=27/a=274003/pdf

Reference20 articles.

1. Electron Beam Generated Plasmas for Ultra Low TeProcessing

2. Controlling the electron energy distribution function of electron beam generated plasmas with molecular gas concentration: I. Experimental results

3. Theoretical overview of the large-area plasma processing system (LAPPS)

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