Synthesis and characterization of pure C40 TiSi2
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1329864
Reference12 articles.
1. The Future Of Silicide For CMOS Contacts
2. Silicides for integrated circuits: TiSi2 CoSi2
3. Elastic constants and thermal expansion coefficient of metastable C49 TiSi2
4. Metastable phase formation in titanium‐silicon thin films
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1. C54-TiSi2 formation using nanosecond laser annealing of A-Si/Ti/A-Si stacks;Thin Solid Films;2024-06
2. Lattice stability and point defect energetics of TiSi2 and TiGe2 allotropes from first-principles calculations;Journal of Applied Physics;2021-02-28
3. Interactions of Ti and its oxides with selected surfaces: Si(100), HOPG(0001) and graphene/4H-SiC(0001);Surface and Coatings Technology;2020-09
4. Theoretical prediction of structural, elastic and thermodynamic properties of transition metal monosilicides CrSi, TiSi and ZrSi under high pressure;Materials Today Communications;2020-09
5. Impact of nanosecond laser energy density on the C40-TiSi2 formation and C54-TiSi2 transformation temperature;Journal of Applied Physics;2020-08
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