Influence of electrode separation and gas curtain on extreme ultraviolet emission of a gas jet z-pinch source
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2240701
Reference9 articles.
1. Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas
2. A novel fast capillary discharge system emitting intense EUV radiation
3. Characteristics of Xenon Capillary Z-Pinch Extreme Ultraviolet Lithography Source Driven by DifferentdI/dtDischarge Current Pulses
4. Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency
5. EUV discharge light source based on a dense plasma focus operated with positive and negative polarity
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1. Pinch formation and the zippering effect in laser-triggered discharge plasma under various electrode separations;AIP Advances;2019-08
2. Xenon Z-Pinch Discharge Plasma EUV Source Driven by Ultrashort Current Pulse;IEEE Transactions on Plasma Science;2016-07
3. Nanosecond-Range Multiple-Pulse Synchronization Controlled by Magnetic Switches Based on a Communal Magnetic Core;IEEE Transactions on Plasma Science;2013-02
4. Counter-facing plasma focus system as an efficient and long-pulse EUV light source;SPIE Proceedings;2011-03-17
5. EUV diagnostics of pulsed plasma systems;Journal of Physics: Conference Series;2010-02-01
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