EUV discharge light source based on a dense plasma focus operated with positive and negative polarity-Reference-Cited by-同舟云学术

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EUV discharge light source based on a dense plasma focus operated with positive and negative polarity

Published:2004-11-20 Issue:23 Volume:37 Page:3266-3276
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Fomenkov I V,Böwering N,Rettig C L,Melnychuk S T,Oliver I R,Hoffman J R,Khodykin O V,Ness R M,Partlo W N

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/37/i=23/a=007/pdf

Reference34 articles.

1. 15. Dense Plasma Focus

2. Physical properties of the HCT EUV source

3. Effects of anode shape on plasma focus operation with argon

4. Comparative study of ion, x-ray and neutron emission in a low energy plasma focus

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