Competitive growth mechanisms of aluminum nitride thin films deposited by off-normal reactive magnetron sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2917063
Reference16 articles.
1. Synthesis of compound thin films by dual ion beam deposition. II. Properties of aluminum‐nitrogen films
2. Preparation of highly oriented polycrystalline AlN thin films deposited on glass at oblique-angle incidence
3. Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature
4. Control of the preferred orientation of AlN thin films by collimated sputtering
5. First-principles study on electronic and elastic properties of BN, AlN, and GaN
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