Control of the preferred orientation of AlN thin films by collimated sputtering-Reference-Cited by-同舟云学术

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Control of the preferred orientation of AlN thin films by collimated sputtering

Published:1998-05 Issue:3 Volume:16 Page:1244-1246
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Rodrı́guez-Navarro A.,Otaño-Rivera W.,Pilione L. J.,Messier R.,Garcı́a-Ruiz J. M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581267

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of a wider bandgap θ-Al₂O₃ by oxidation of ultrathin AlN films for leakage current reduction;Japanese Journal of Applied Physics;2024-02-16

2. Theoretical and experimental study of the gradient properties and the resulting local crystalline structure and orientation in magnetron-sputtered CrAlN coatings with lateral composition and thickness gradient;Journal of Applied Crystallography;2017-06-14

3. Deposition of Inclined Orientation Film Using Collimated Sputtering;IEEE Transactions on Magnetics;2011-10

4. Highly piezoelectric AlN thin films grown on amorphous, insulating substrates;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-05

5. Competitive growth mechanisms of aluminum nitride thin films deposited by off-normal reactive magnetron sputtering;Journal of Applied Physics;2008-04-15

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