Mass‐resolved ion energy measurements at both electrodes of a 13.56 MHz plasma in CF4
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.362630
Reference20 articles.
1. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
2. Plasma potentials of 13.56‐MHz rf argon glow discharges in a planar system
3. Angular ion and neutral energy distribution in a collisional rf sheath
4. Mass‐resolved ion energy measurements at the grounded electrode of an argon rf plasma
5. Distribution of ion energies incident on electrodes in capacitively coupled rf discharges
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1. Comparison of ion energies and fluxes at the substrate during magnetron sputtering of ZnO : Al for dc and rf discharges;Journal of Physics D: Applied Physics;2013-07-10
2. Electron heating and the electrical asymmetry effect in dual-frequency capacitive CF4discharges;Plasma Sources Science and Technology;2011-06-03
3. Ion energy distributions for the identification of active species and processes in low pressure hollow cathode discharges;Plasma Sources Science and Technology;2009-07-15
4. Comparison of measurements and particle-in-cell simulations of ion energy distribution functions in a capacitively coupled radio-frequency discharge;Physics of Plasmas;2007-10
5. Ion kinetic effects in radio-frequency sheaths;Physics of Plasmas;2005-03
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