Comparison of ion energies and fluxes at the substrate during magnetron sputtering of ZnO : Al for dc and rf discharges
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/46/i=31/a=315202/pdf
Reference43 articles.
1. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
2. A structure zone diagram including plasma-based deposition and ion etching
3. Equipment, materials and processes: a review of high rate sputtering technology for glass coating
4. Magnetron sputtering: a review of recent developments and applications
5. Influence of negative ion resputtering on ZnO:Al thin films
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