Monitoring metal contamination of silicon by multiwavelength room temperature photoluminescence spectroscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4769746
Reference15 articles.
1. Iron contamination in silicon technology
2. Characteristics of Spontaneous Reaction Occurred by Metal Contamination and Silicon Substrate for Ultralarge-Scale Integration Semiconductor Process
3. Study of Metal Contamination in CMOS Image Sensors by Dark-Current and Deep-Level Transient Spectroscopies
4. Novel methods of TXRF analysis for silicon wafer surface inspection
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