On the deposition rate in a high power pulsed magnetron sputtering discharge
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2362575
Reference13 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
3. Influence of high power densities on the composition of pulsed magnetron plasmas
4. Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy
5. 47th Annual Technical Conference Proceedings;Sproul W. D.,2004
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