Effect of pulse configuration on the reactive deposition of TiN coatings using HiPIMS

Author:

Larhlimi H.,Makha M.,Alami J.

Funder

OCP Group

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference37 articles.

1. Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films;Karimi Aghda;Acta Mater.,2021

2. On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering;Alami;J. Phys. D Appl. Phys.,2009

3. Thin Film Nucleation, Growth, and Microstructural Evolution: An Atomic Scale View, Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology;Greene,2010

4. High power pulsed magnetron sputtering: a review on scientific and engineering state of the art;Sarakinos;Surf. Coat. Technol.,2010

5. Plasma dynamics in a highly ionized pulsed magnetron discharge;Alami;Plasma Sources Sci. Technol.,2005

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