Improvement of crystalline silicon surface passivation by hydrogen plasma treatment
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1647702
Reference13 articles.
1. Record low surface recombination velocities on 1 Ω cm p‐silicon using remote plasma silicon nitride passivation
2. Passivation of silicon by silicon nitride films
3. Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films
4. Surface passivation ofn-type crystalline Si by plasma-enhanced-chemical-vapor-deposited amorphous SiCx:H and amorphous SiCxNy:H films
5. A fully automated hot‐wall multiplasma‐monochamber reactor for thin film deposition
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