A fully automated hot‐wall multiplasma‐monochamber reactor for thin film deposition-Reference-Cited by-同舟云学术

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A fully automated hot‐wall multiplasma‐monochamber reactor for thin film deposition

Published:1991-07 Issue:4 Volume:9 Page:2331-2341
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Roca i Cabarrocas P.,Chévrier J. B.,Huc J.,Lloret A.,Parey J. Y.,Schmitt J. P. M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577318

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