Boron activation in silicon thin films grown by PECVD under epitaxial and microcrystalline conditions
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces
Reference24 articles.
1. S.W. Glunz, et al., Passivating and Carrier-selective Contacts - Basic Requirements and Implementation, 2017 IEEE 44th Photovoltaic Specialist Conference (PVSC), DC, USA, 2017, 2064–2069. doi:10.1109/PVSC.2017.8366202.
2. Passivating contacts for silicon solar cells based on boron-diffused recrystallized amorphous silicon and thin dielectric interlayers;Yan;Sol. Energy Mater. Sol. Cells,2016
3. High quality boron-doped epitaxial layers grown at 200°C from SiF4/H2/Ar gas mixtures for emitter formation in crystalline silicon solar cells;Léal;AIP Adv,2017
4. Ultra-shallow junctions formed by quasi-epitaxial growth of boron and phosphorous-doped silicon films at 175°C by rf-PECVD;Labrune;Thin Solid Films,2010
5. Annealing of boron-doped hydrogenated crystalline silicon grown at low temperature by PECVD;Chrostowski;Materials (Basel),2019
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3