Confinement of high Be doping levels in AlInAs/GaInAsnpnheterojunction bipolar transistors by low temperature molecular‐beam epitaxial growth
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.109677
Reference23 articles.
1. The design, fabrication, and characterization of a novel electrode structure self-aligned HBT with a cutoff frequency of 45 GHz
2. Performance potential of high-frequency heterojunction transistors
3. AlInAs/GaInAs HBT IC technology
4. Ultrahigh Be doping of Ga0.47In0.53As by low‐temperature molecular beam epitaxy
5. Ultra-high doping levels of GaAs with beryllium by molecular beam epitaxy
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1. High current density tunnel diodes for multi-junction photovoltaic devices on InP substrates;Applied Physics Letters;2021-02-08
2. Molecular beam epitaxy of III–V ferromagnetic semiconductors;Molecular Beam Epitaxy;2013
3. Be diffusion behavior in InGaAs, InGaAsP and InGaAs/InGaAsP GSMBE structures;Journal of Crystal Growth;2003-05
4. Effect of emitter design on the dc characteristics of InP-based double-heterojunction bipolar transistors;Semiconductor Science and Technology;2001-02-15
5. Beryllium diffusion in InGaAs/InGaAsP structures grown by gas source molecular beam epitaxy;Materials Science and Engineering: B;2000-02
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