Impact of current-induced degradation process on the electro-optical characteristics of InGaN/GaN multiple-quantum-well photodetectors fabricated on sapphire substrate
Author:
Affiliation:
1. Research Center for Nano-Devices and Advanced Materials, Nagoya Institute of Technology, Nagoya 466-8555, Japan
2. Innovation Center for Multi-Business of Nitride Semiconductors, Nagoya Institute of Technology, Nagoya 466-8555, Japan
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0027127
Reference32 articles.
1. Next-generation self-powered and ultrafast photodetectors based on III-nitride hybrid structures
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3. Degradation of AlGaN-based metal-semiconductor-metal photodetectors
4. Study of effective carrier lifetime and ideality factor of BPW 21 and BPW 34B photodiodes from above room temperature to liquid nitrogen temperature
5. Wide-bandgap semiconductor ultraviolet photodetectors
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