Manipulation and simulations of thermal field profiles in laser heat-mode lithography-Reference-Cited by-同舟云学术

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Manipulation and simulations of thermal field profiles in laser heat-mode lithography

Published:2017-12-14 Issue:22 Volume:122 Page:223107
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Wei Tao¹²,Wei Jingsong¹,Wang Yang¹,Zhang Long¹³

Affiliation:

1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

2. University of Chinese Academy of Sciences, Beijing 100049, China

3. Collaborative Innovation Center of IFSA (CICIFSA), Shanghai Jiao Tong University, Shanghai 200240, China

Funder

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5002575

Reference50 articles.

1. Advanced scanning probe lithography

2. High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution

3. Focused ion beam high resolution grayscale lithography for silicon-based nanostructures

4. ION BEAM LITHOGRAPHY AND NANOFABRICATION: A REVIEW

5. Enhanced performance of solar cells with anti-reflection layer fabricated by nano-imprint lithography

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3. Ge₂Sb₂Te₅ Thin Film as a Promising Heat‐Mode Resist for High‐Resolution Direct Laser Writing Lithography;physica status solidi (RRL) – Rapid Research Letters;2023-08-22

4. Mechanism of Corrosion Selectivity of NSb₂Te Thin Films in the H₃PO₄/HNO₃ Developer for Direct Laser Writing Nanolithography;ACS Applied Nano Materials;2023-07-04

5. AgGeSbTe thin film as a negative heat-mode resist for dry lithography;Chinese Optics Letters;2022

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